CO2-processes photoresists, polymers, and photoactive compounds for microlithography
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2004
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DeSimone, J. M., & Carbonell, R. G., Kendall, J., & McAdams, C. L. (2004). CO2-processes photoresists, polymers, and photoactive compounds for microlithography. U.S. Patent No. 6,764,809. Washington, DC: U.S. Patent and Trademark Office.
